An improved method for determination of extrinsic resistances for HEMT devices based on 110 GHz S-parameters on-wafer measurement
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Affiliation:

1.School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China;2.School of Transportation and Civil Engineering, Nantong University, Nantong 226019, China

Clc Number:

TN215

Fund Project:

Supported by the National Natural Science Foundation of China (62201293,62034003)

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    Abstract:

    An improved method for determination of extrinsic resistances for 70 nm InP high electron mobility transistor (HEMT) is proposed in this paper. A set of expressions have been derived from the equivalent circuit model under operating bias points (Vgs > VthVds = 0 V). The extrinsic resistances are iterative determined using the discrepancy between simulated and measured S-parameters as an optimization criterion using the semi-analytical method. Good agreement between simulated and measured S-parameters under multi bias over the frequency range up to 110 GHz verifies the effectiveness of this extraction method.

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LI Zhi-Chun, LYU Yuan-Ting, ZHANG Ao, GAO Jian-Jun. An improved method for determination of extrinsic resistances for HEMT devices based on 110 GHz S-parameters on-wafer measurement[J]. Journal of Infrared and Millimeter Waves,2024,43(1):105~110

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History
  • Received:May 23,2023
  • Revised:November 06,2023
  • Adopted:June 23,2023
  • Online: January 17,2024
  • Published: February 25,2024
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