Abstract
In this paper, a wide band cascode power amplifier working at 33~170 GHz is designed, based on the 500 nm InP dual-heterojunction bipolar transistor (DHBT) process. Two pairs of parallel input and output stub lines can effectively expand the working bandwidth. The output coupling line compensates the high frequency transmission. The measured results show that the maximum gain of the amplifier is 11.98 dB at 115 GHz, the relative bandwidth is 134.98 %, the gain flatness is ±2 dB, the gain is better than 10 dB and the output power is better than 1 dBm in the operating bandwidth.
With the increasing demand for high data rate and high resolution, it is foreseeable that millimeter wave radar, imaging and communication systems will become are widely applied
In this paper, an ultra-wideband cascode amplifier operating at 33~170 GHz is demonstrated. The proposed amplifier can achieve 134.98% relative bandwidth and maintain a gain flatness of ±2 dB, with the small signal gain better than 10 dB and the output power better than 1 dBm over the operating bandwidth.
The monolithic microwave integrated circuit (MMIC) was fabricated based on 500-nm dual-heterojunction bipolar transistor (DHBT) process on 3 inch semi-insulating InP substrate using molecular-beam epitaxy (MBE) manufactured by Nanjing Electronic Devices Institute. An InGaAsP composite collector was used to eliminate the current blocking effect caused by the B-C heterojunction conduction band spik

Fig. 1 The fT and fmax of the transistor
图1 器件的fT 和 fmax
Layer | Material | Thickness/nm | Dopant |
---|---|---|---|
Emitter contact | InGaAs | 200 | Si |
Emitter | InP | 200 | Si |
Base | InGaAs | 35 | C |
Setback layer | InGaAs | 30 | Si |
Step-graded | InGaAsP | 50 | Si |
δ-doping | InP | 5 | Si |
Collector | InP | 150 | Si |
Collector contact | InGaAs | 50 | Si |
Sub-collector | InP | 200 | Si |
InP substrate | 100 µm | S.I. |
The schematic diagram of the multilayer integrated circuit process used in this paper is shown in

Fig. 2 Schematic cross-sectional view of (a) multilayer interconnect, and (b) thin-film microstrip lines
图2 (a)多层互联结构和,(b)薄膜微带线示意图

Fig. 3 Block diagram of the typical cascode amplifier
图3 典型共源共栅放大器结构示意图

Fig. 4 Circuit topology for the wide band cascode amplifier
图4 宽带共源共栅放大器电路拓扑结构

Fig. 5 Impedance matching Smith chart and the network schematic
图5 Smith chart匹配和拓扑结构

Fig. 6 Chip photograph of the cascode amplifier MMIC. Size: 1.0 mm × 0.8 mm
图6 放大器照片,整体尺寸:1.0 mm × 0.8 mm
Characterization of the MMIC cascode amplifiers were obtained by on-wafer measurements. The measured results are shown in

Fig. 7 Measured and simulated S-parameters of the broadband amplifier MMIC On-wafer bias: Vb1=1.5 V, Vb2/Vc=2.5 V
图7 仿真与测试S参数对比,在片测试偏置:Vb1=1.5 V, Vb2/Vc=2.5 V。

Fig. 8 Output power measured results
图8 输出功率测试结果
The measured results show that the maximum gain of the amplifier at 115 GHz is 11.98 dB, and the 3 dB bandwidth is 33 to 170 GHz (134.98%).
Ref. | . f/GHz | Technology | Gain /dB | Gain Flatness/dB | Topology/ Devices | Chip-size /m | Pout/dBm |
---|---|---|---|---|---|---|---|
[ | 40~185 | 500 nm InP DHBT | 10 | ±2 |
Distributed ×10 | 0.8×0.75 | 10 |
[ | 0~110 | 100 nm GaAs pHEMT | 6 | ±2.5 |
Cascode ×2 | - | - |
[ | 123~143 | 130 nm SiGe BiCMOS | 24.3 | - |
Cascode ×10 | 0.7×0.43 | 7.7 |
[ | 110~170 | SiGe BiCMOS | 10.8 | ±2.5 |
Cascode ×2 | 0.035 | - |
[ | 118~236 | 35 nm GaAs mHEMT | 10 | - |
Cascode ×8 | 1.5×0.5 | 10 |
This work | 33~170 |
500 nm InP DHBT | 10 | ±2 |
Cascode ×2 | 1.0×0.8 | 1.8 |
In this paper, a wide band amplifier is presented, which exhibits a good operating bandwidth (better than 1 dBm in the range of 35~134 GHz). The high 134.98% relative bandwidth completely covers the Q, V, W and D bands, which makes it a suitable option for measurement and spectroscopic systems. In the future, the cascode amplifier shown in this paper can be used as a cell to achieve greater output power through power combining.
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